Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor

The bis(tert-butylimido)-molybdenum(VI) framework has previously been used for the successful atomic layer deposition (ALD) and chemical vapor of many molybdenum-containing thin films. Here, we have prepared fully characterized a new thermally robust bis(tert-butylimido)molybdenum(VI) complex, bis(tert-butylimido)-bis(N-2-(tert-butyliminomethyl)pyrrolato)-molybdenum(VI), (tBuN)2Mo(PyrIm)2 (1), that incorporates two N,N’-κ2-monoanionic ligands. volatility thermal stability 1 were measured using thermogravimetric analysis differential scanning calorimetry, where it was found to achieve pressure Torr at 212 °C had an onset decomposition 273 °C. A comparison its properties with those known ALD precursor (tBuN)2Mo(dpamd)2 (dpamd = N,N’-diisopropyl-acetamidinato) showed similar but 78 improvement in stability. Preliminary experiments indicated should be good precursor; exhibited self-limiting adsorption did not decompose on surface until least 500 °C, features will enable use development high-temperature processes.